Doi.org/10.7567/jjap.55.089203

Target Article

Retraction: 'Surface Chemistry of Preferentially (111)- and (220)-Crystal-Oriented Microcrystalline Silicon Films by Radio-Frequency Plasma-Enhanced Chemical Vapor Deposition'; Ohba, Daisuke; Lai, Chien-Hui; Tang, Zeguo; Shirai, Hajime; ; NULL; 2016-8-1; https://doi.org/10.7567/jjap.55.089203

Reasons

Note: Reasons not yet here included, but you are welcome to insert this information whenever you wish.